2

Rapid thermal annealing of arsenic-implanted silicon: A review

Year:
1988
Language:
english
File:
PDF, 1.44 MB
english, 1988
4

Diffusion model for an inhomogeneous medium

Year:
1987
Language:
english
File:
PDF, 457 KB
english, 1987
5

Rapid thermal anneal of arsenic implanted into Si(100) and Si(111)

Year:
1987
Language:
english
File:
PDF, 353 KB
english, 1987
6

Effect of a temperature gradient on arsenic diffusion in silicon

Year:
1988
Language:
english
File:
PDF, 397 KB
english, 1988
7

Advanced function approach

Year:
2011
Language:
english
File:
PDF, 458 KB
english, 2011
19

Energy relaxation of hot electrons in degenerate p-type III–V semiconductors

Year:
1994
Language:
english
File:
PDF, 267 KB
english, 1994
20

Multichamber processing for optoelectronics

Year:
1994
Language:
english
File:
PDF, 795 KB
english, 1994
21

Neutron quantum well states in Fe/Co/Fe trilayers

Year:
2004
Language:
english
File:
PDF, 234 KB
english, 2004